Blueshift of yellow luminescence band in self-ion-implanted n-GaN nanowire

dc.contributor國立臺灣師範大學化學系zh_tw
dc.contributor.authorS. Dharaen_US
dc.contributor.authorA Dattaen_US
dc.contributor.authorC.-T. Wuen_US
dc.contributor.authorZ.-H. Lanen_US
dc.contributor.authorK.-H. Chenen_US
dc.contributor.authorY. -L. Wangen_US
dc.contributor.authorY.-F. Chenen_US
dc.contributor.authorC.-W. Hsuen_US
dc.contributor.authorL.-C. Chenen_US
dc.contributor.authorH.-M. Linen_US
dc.contributor.authorChia-Chun Chenen_US
dc.date.accessioned2014-12-02T06:41:32Z
dc.date.available2014-12-02T06:41:32Z
dc.date.issued2004-05-03zh_TW
dc.description.abstractOptical photoluminescence studies are performed in self-ion (Ga+)-implanted nominally dopedn-GaNnanowires. A 50 keV Ga+focused ion beam in the fluence range of 1×1014–2×1016 ions cm−2 is used for the irradiation process. A blueshift is observed for the yellow luminescence (YL) band with increasing fluence. Donor–acceptor pair model with emission involving shallow donor introduced by point-defect clusters related to nitrogen vacancies and probable deep acceptor created by gallium interstitial clusters is responsible for the shift. High-temperature annealing in nitrogen ambient restores the peak position of YL band by removing nitrogen vacancies.en_US
dc.description.urihttp://scitation.aip.org/docserver/fulltext/aip/journal/apl/84/18/1.1738172.pdf?expires=1395217473&id=id&accname=424340&checksum=D55825637DB0A9D91B37410194885A9Fzh_TW
dc.identifierntnulib_tp_C0301_01_027zh_TW
dc.identifier.issn0003-6951zh_TW
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw/handle/20.500.12235/42311
dc.languageen_USzh_TW
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relationApplied Physics Letters, 84(18), 3486-3488.en_US
dc.relation.urihttp://dx.doi.org/10.1063/1.1738172zh_TW
dc.titleBlueshift of yellow luminescence band in self-ion-implanted n-GaN nanowireen_US

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