相變化薄膜光熱效應奈米微影

Abstract

本論文主旨在於研究不同膜層結構的相變化材料對鹼性溶液之蝕刻特性。利用萊卡光譜儀與表面輪廓儀來量測薄膜蝕刻後之光學與物理性質，並使用波長658nm之紅光雷射泵探系統(靜態測試儀)製作樣品。經過溶液蝕刻後，由原子力顯微儀(Atomic Force Microscope)對記錄點進行掃探所得到的表面形貌資訊，來研究不同膜層結構相變化薄膜之記錄點型態。並可充分且完整的了解相變化材料在光熱作用與濕式蝕刻下之變化。將來可應用於奈米微影技術，用以取代昂貴的半導體製程技術。

In this thesis, we study the selective etching properties between as-deposited and crystalline phase of Ge2Sb2Te5 alloy film carried out with an alkaline etching solution of NaOH. The optical and physical properties of the thin films before and after etching are measured by Lycra spectrometer and surface profile. And we use the optical pump-probe system and atomic force microscopy (AFM) to manufacture the sample and investigate the topographic change. Through the complete experiments, results showed the etching of the crystalline film is fast than the as-deposited Ge2Sb2Te5 film. The disordered amorphous region acts as an resistant mask. A novel high throughput and low cost nanolithography method is developed by the Ge2Sb2Te5 phase-change masking thin films. The special Opto-thermal effect of phase-change material can be applied to the Nanolithography in the future.