KrF準分子雷射LIGA製程用厚膜光阻劑之合成與應用

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dc.contributor國立臺灣師範大學機電工程學系;國立清華大學化學工程系zh_tw
dc.contributor.author李育德zh_tw
dc.contributor.author楊啟榮zh_tw
dc.date.accessioned2014-10-30T09:36:23Z
dc.date.available2014-10-30T09:36:23Z
dc.date.issued2000-07-31zh_TW
dc.identifierntnulib_tp_E0403_04_015zh_TW
dc.identifier.urihttp://rportal.lib.ntnu.edu.tw/handle/20.500.12235/37042
dc.languagechizh_TW
dc.relation（國科會專題研究計畫，NSC89-2216-E007-007）zh_tw
dc.subject.other微機電系統zh_tw
dc.subject.other準分子雷射zh_tw
dc.subject.other深蝕光刻電鑄模造術zh_tw
dc.subject.other光分解挖除zh_tw
dc.subject.otherMicroelectromechanical systems (MEMS)en_US
dc.subject.otherExcimer laseren_US
dc.subject.otherLIGAen_US
dc.subject.otherPhotoablationen_US
dc.titleKrF準分子雷射LIGA製程用厚膜光阻劑之合成與應用zh_tw
dc.titleSynthesis and Application of Thick Film Resist Satisfied with KrF Excimer Laser LIGA Processen_US

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